Hydrogen-sensitive palladium (PD) membrane/semiconductor schottk

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Responsive to non-optical – non-electrical signal

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

257253, 257414, 257472, 257473, 257485, 438 49, 204431, H01L 2358

Patent

active

061602787

ABSTRACT:
In this invention, a new, simple and small-size hydrogen-sensitive palladium (Pd) membrane/semiconductor Schottky diode sensor has been developed and fabricated. First, a high quality undoped GaAs buffer layer and an n-type GaAs epitaxial layer with the carrier concentration of 2.times.10.sup.17 cm.sup.31 3 is grown by molecular beam epitaxy (MBE) on a semi-insulated GaAs substrate. Then a thin Pd membrane is evaporated on the surface of the n-type GaAs epitaxial layer by the vacuum evaporation technique. It is well-known that palladium metal has excellent selectivity and sensitivity on hydrogen gas. When hydrogen gas diffuses to the Pd membrane surface, the hydrogen molecules will dissociate into hydrogen atoms. Some of the hydrogen atoms diffuse through the thin metal layer and form the palladium hydride near the metal-semiconductor interface. The hydride may effectively lower the work function of Pd metal. The lowering of work function results in the reduction of Schottky barrier height at the Pd metal-GaAs semiconductor interface and the modification in the measured current-voltage characteristics of the studied device. Experimental results reveal that, during the hydride formation process, the forward- and reverse-biased currents are increased by the increase of hydrogen concentration. It also demonstrates that the Schottky barrier height is indeed decreased with increasing the hydrogen concentration. Therefore, the studied device can be used in fabricating a high-performance hydrogen-sensitive sensor.

REFERENCES:
patent: 4211587 (1980-07-01), Massies et al.
patent: 4379005 (1983-04-01), Hovel et al.
patent: 4543442 (1985-09-01), Alcorn et al.
patent: 5516725 (1996-05-01), Chang et al.
patent: 5652443 (1997-07-01), Kasai
patent: 5923072 (1999-07-01), Wada et al.
Lundstrom et al, Journal of Applied Physics, vol. 46, No. 9, "A hydrogen-sensitive Pd-gate . . . ", Sep. 1975, pp. 3876-3881.
Steele et al, Applied Physics Letters, vol. 28, No. 11, "Palladium/cadmium-sulfide . . . ", Jun. 1, 1976, pp. 687-688.
K. Ito, Surface Science, vol. 86, "Hydrogen-sensitive Schottky barrier diodes", 1979, pp. 345-352.
M. Armgarth et al, Appl. Phys. Lett., vol. 39, "A stable hydrogen-sensitive Pd gate . . . ", Jul. 1, 1981, pp. 91-92.
S. Morrison, Sensors and Actuators, vol. 2, "Semiconductor Gas Sensors", 1982, pp. 329-341.
A. Sibbald, IEE Proceedings, vol. 130, No. 5, "Chemical-sensitive field-effect . . . ", Oct. 1983, pp. 233-244.
Ching-Chang WEN et al, IEEE Trans. on Electron Devices, vol. 26, No. 12, "Gate-Controlled Diodes . . . ", Dec. 1979, pp. 1945-1951.
H. Wohltjen, Analytical Chemistry, vol. 56, No. 1, "Chemical Microsensors and . . . ", 1984, pp. 87A-88A.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Hydrogen-sensitive palladium (PD) membrane/semiconductor schottk does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Hydrogen-sensitive palladium (PD) membrane/semiconductor schottk, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Hydrogen-sensitive palladium (PD) membrane/semiconductor schottk will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-220547

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.