Chemical apparatus and process disinfecting – deodorizing – preser – Chemical reactor – With means applying electromagnetic wave energy or...
Patent
1995-04-25
1996-11-12
Jordan, Charles T.
Chemical apparatus and process disinfecting, deodorizing, preser
Chemical reactor
With means applying electromagnetic wave energy or...
422906, B01J 1908
Patent
active
055749585
ABSTRACT:
An apparatus for producing hydrogen radicals, includes (a) a pipe having a cross-sectional area decreasing toward one end from the other thereof, the pipe being composed of metal having a high melting point, (b) a filament for generating heat by running an electrical current therethrough, the filament being disposed in the pipe free of contact with the pipe, and (c) a hydrogen gas source for supplying hydrogen gas to the pipe through the end of the pipe with the larger cross-sectional area. The pipe is electrically isolated from any peripherals, including the filament. The apparatus provides a high production rate of hydrogen radicals, and also prevents gas leakage therefrom, avoiding contamination.
REFERENCES:
patent: 3916034 (1975-10-01), Tsuchimoto
patent: 4740263 (1988-04-01), Imai et al.
patent: 4859490 (1989-08-01), Ikegaya et al.
patent: 4900628 (1990-02-01), Ikegaya et al.
patent: 5145712 (1992-09-01), Jesser et al.
patent: 5269848 (1993-12-01), Nakagawa
patent: 5399230 (1995-03-01), Takatani et al.
"Condensed Chemical Dictionary", G. G. Hawley, 1981, pp. 42-43.
Takeyoshi Sugaya et al., "Low-Temperature Cleaning of GaAs Substrate by Atomic Hydrogen Irradiation", Japanese Journal of Applied Physics, vol. 30, No. #A, Mar. 1991, pp. L402-L404.
Jenkins Daniel
Jordan Charles T.
NEC Corporation
LandOfFree
Hydrogen radical producing apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Hydrogen radical producing apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Hydrogen radical producing apparatus will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-573492