Hydrogen peroxide method using optimized H+ and BR- concentratio

Chemistry of inorganic compounds – Oxygen or compound thereof – Peroxide

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C01B 1502

Patent

active

048897051

ABSTRACT:
A catalytic process for making H.sub.2 O.sub.2 from H.sub.2 and O.sub.2 in an aqueous medium which comprises using H.sup.+ ions and BR.sup.- ions each, independently, in the range from about 0.001 to about 0.05 M.

REFERENCES:
patent: 3336112 (1967-08-01), Hooper
patent: 3361533 (1968-01-01), Hooper
patent: 3433582 (1969-03-01), Campbell
patent: 4007256 (1977-02-01), Kim et al.
patent: 4009252 (1977-02-01), Izumi et al.
patent: 4279883 (1981-07-01), Izumi et al.
patent: 4335092 (1982-06-01), Dalton, Jr. et al.
patent: 4336238 (1982-06-01), Dalton, Jr. et al.
patent: 4336239 (1982-06-01), Dalton, Jr. et al.
patent: 4379778 (1983-04-01), Dalton, Jr. et al.
patent: 4389390 (1983-06-01), Dalton, Jr. et al.
patent: 4661337 (1987-04-01), Brill
patent: 4681751 (1987-07-01), Gosser
patent: 4772458 (1988-09-01), Gosser et al.
Posplova et al., Russian Journal of Physical Chemistry, 35(2): 143-148, (1961).
Swern, Organic Peroxides, Wiley--Interscience, New York, p. 26, (1970).
Schumb et al., Hydrogen Peroxide, Reinhold Publishing Corporation, p. 179, (1955).
Halle, Chemical and Engineering News, 62(27): 4, (1984).
Schwoegler, Chemical and Engineering News, 63(1): 6, (1985).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Hydrogen peroxide method using optimized H+ and BR- concentratio does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Hydrogen peroxide method using optimized H+ and BR- concentratio, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Hydrogen peroxide method using optimized H+ and BR- concentratio will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1576529

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.