Hydrogen peroxide-free and hydrofluoric acid-free autodeposition

Details Hydrogen peroxide-free and hydrofluoric acid-free autodeposition Hydrogen peroxide-free and hydrofluoric acid-free autodeposition

1985-03-28

1985-11-19

Michl, Paul R.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

At least one aryl ring which is part of a fused or bridged...

148 62, 427435, 524300, 524401, 524428, 524438, C08K 316

Patent

active

045543054

ABSTRACT:
Autodeposition unsaturated latex baths which are hydrogen peroxide-free (using iodine or certain iodine salts or free acids as the oxidizer) and which are hydrofluoric acid-free (using, preferably, acetic acid) afford coatings which can incorporate silicate-containing pigments, fillers, and other ingredients.

REFERENCES:
patent: 3585084 (1971-06-01), Steinbrecher et al.
patent: 3592699 (1971-07-01), Steinbrecher et al.
patent: 3709743 (1973-01-01), Dalton et al.
patent: 4186219 (1980-01-01), Hall
patent: 4215162 (1980-07-01), Kunnen
patent: 4313983 (1982-02-01), Chaker
patent: 4373050 (1983-02-01), Steinbrecher et al.
patent: 4414350 (1983-11-01), Hall

Affiliated with

Also associated with

Rating

Hydrogen peroxide-free and hydrofluoric acid-free autodeposition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Hydrogen peroxide-free and hydrofluoric acid-free autodeposition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Hydrogen peroxide-free and hydrofluoric acid-free autodeposition will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-84225