Hydrogen fluoride dopant source in the preparation of conductive

Details Hydrogen fluoride dopant source in the preparation of conductive Hydrogen fluoride dopant source in the preparation of conductive

1994-08-29

1996-03-05

King, Roy V.

Coating processes

Electrical product produced

Transparent base

4271263, 4272481, 427255, 4272551, 4272552, 65 605, C23C 1600, B05D 512

Patent

active

054965837

ABSTRACT:
The present invention relates to the production of hydrogen fluoride dopant source gases for use in the production of conductive coatings on a substrate. More specifically, a fluorocarbon source gas is decomposed in the presence of oxygen to yield HF which is passed to a deposition furnace wherein a fluoride doped metal oxide coated glass substrate is prepared.

REFERENCES:
patent: 4590096 (1986-05-01), Lindner
patent: 4880664 (1989-11-01), O'Dowd et al.
patent: 5102721 (1992-04-01), O'Dowd et al.
patent: 5393563 (1995-02-01), Ellis, Jr.

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