Hydrogen absorbing electrode and metal oxide-hydrogen secondary

Chemistry: electrical current producing apparatus – product – and – Current producing cell – elements – subcombinations and... – Electrode

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429223, 420900, H01M 438, C01B 624

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active

060664150

ABSTRACT:
A hydrogen absorbing electrode containing a hydrogen absorbing alloy consisting mainly of AB.sub.3 type crystal-structure phase and represented by the following formula (I) is provided

REFERENCES:
patent: 4215008 (1980-07-01), Hagiwara et al.
patent: 4375257 (1983-03-01), Bruning et al.
patent: 5290509 (1994-03-01), Furukawa et al.
patent: 5304345 (1994-04-01), Fujitani et al.
patent: 5496424 (1996-03-01), Fujitani et al.
patent: 5817222 (1998-10-01), Kaneko
patent: 5840166 (1998-11-01), Kaneko
patent: 5858571 (1999-01-01), Ishii et al.
Hiroshi Miyamura, et al., "Characteristics of Electrodes Using Amorphous AB.sub.2 Hydrogen Storage Alloys", Journal of the Less-Common Metals, 172-174 (1991), pp. 1205-1210 (month N/A).
Yan LI, et al., "Amorphous La-Ni Thin Film Electrodes", Journal of Alloys and Compounds 223 (1995), pp. 6-12 (month N/A).
O.A. Petrii, et al., "Investigation of Materials Based on Intermetallic Compounds of the CeNi.sub.3 -CeCo.sub.3 System and a Polymeric Binding Material", Journal of the Less-Common Metals, 136 (1987)pp. 121-134 (month N/A).

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