Hydroformylation process using novel phosphine-rhodium catalyst

Organic compounds -- part of the class 532-570 series – Organic compounds – Heavy metal containing

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

556 15, 556 17, 568454, C07F 1500

Patent

active

053328469

ABSTRACT:
Disclosed are bis-phosphine compounds having the general formula ##STR1## wherein: each of A.sup.1, A.sup.2, A.sup.3 and A.sup.4 is an arylene radical wherein (i) each phosphorus atom P is bonded to a ring carbon atom of A.sup.1 and A.sup.2 and to a ring carbon atom of A.sup.3 and A.sup.4, (ii) A.sup.1 and A.sup.2, and A.sup.3 and A.sup.4 are bonded to each other by ring carbon atoms and (iii) each of the residues ##STR2## constitutes a 5-membered ring; each of A.sup.5 and A.sup.6 is an arylene radical wherein A.sup.5 and A.sup.6 are bonded to each other and to residues R.sup.1 --C--R.sup.2 and R.sup.3 --C--R.sup.4 by ring carbon atoms and R.sup.1 --C--R.sup.2 and R.sup.3 --C--R.sup.4 are connected to each other through a chain of 4 carbon atoms; and

REFERENCES:
patent: 3949000 (1976-04-01), Violet
patent: 4694109 (1987-09-01), Devon et al.
patent: 4755624 (1988-07-01), Phillips et al.
patent: 4760194 (1988-07-01), Phillips et al.
patent: 4824977 (1989-04-01), Devon
patent: 4851581 (1989-07-01), Devon et al.
patent: 4904808 (1990-02-01), Devon et al.
patent: 5206398 (1993-04-01), Burk

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Hydroformylation process using novel phosphine-rhodium catalyst does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Hydroformylation process using novel phosphine-rhodium catalyst , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Hydroformylation process using novel phosphine-rhodium catalyst will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1054172

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.