Hydrofluoric acid reprocessing for semiconductor standards

Details Hydrofluoric acid reprocessing for semiconductor standards Hydrofluoric acid reprocessing for semiconductor standards

1988-08-12

1990-06-26

Bascomb, Wilbur

Distillation: processes, separatory

With disparate physical separation

Of entrained particles from a vapor or gas

203 12, 203 80, 203 86, 203 98, 203 99, 203DIG9, 156642, 202154, 202176, 202197, 202202, 423483, 423488, 423484, 159DIG15, 159DIG19, B01D 310, C01B 719

Patent

active

049369555

ABSTRACT:
A two-step distillation process provides semiconductor purity, concentrated hydrofluoric acid. Further, the distillation process, occurring under reduced pressures eliminates essentially pure water after the first distillation step. The product output of the second distillation process provides an acid of weight percent greater than 27 weight percent. The product acid is carefully diluted to the required concentrations during the dilution step.

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