Chemistry: electrical current producing apparatus – product – and – Sealed cell having gas prevention or elimation means – Prevention or elimination means is one of the cell...
Patent
1992-10-28
1995-10-24
Springer, David B.
Chemistry: electrical current producing apparatus, product, and
Sealed cell having gas prevention or elimation means
Prevention or elimination means is one of the cell...
420900, H01M 1034, H01M 1052, C01B 624
Patent
active
054608988
ABSTRACT:
The material is derived from the compound TiNi, is a single-phase material and is expressed by the following general formula:
REFERENCES:
patent: 3824131 (1974-07-01), Beccu
patent: 4160014 (1979-07-01), Gamo et al.
patent: 4551400 (1985-11-01), Sapru et al.
patent: 4728586 (1988-03-01), Venkatesan
patent: 5008164 (1991-04-01), Furukawa et al.
patent: 5043233 (1991-08-01), Kameoka et al.
patent: 5128219 (1992-07-01), Kohler et al.
Journal of the Less-Common Metals, 131 (1987) 311-319, "Capacities and Durabilities of Ti-Zr-Ni Alloy Hydride Electrodes and Effects of Electroless Plating on Their Performances", Wakao et al.
Journal of the Less-Common Metals, 104 (1984) 365-373, "Electrochemical Capacities and Corrosion of TiNi.sub.x And Its Zirconium-Substituted Alloy Hydride Electrodes", Wakao, et al.
Journal of the Less-Common Metals, 172-174 (1991) 1236-1245, "A New Pressure-Composition-Temperature Curve Application: Potential of the MH Electrode", Jordy, et al.
Bouet Jacques
Jordy Christian
Knosp Bernard
Percheron-Guegan Annick
Societe Anonyme dite SAFT
Springer David B.
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