Hydrazine bath for chemically depositing nickel and/or cobalt, a

Details Hydrazine bath for chemically depositing nickel and/or cobalt, a Hydrazine bath for chemically depositing nickel and/or cobalt, a

1986-11-19

1989-07-04

Barr, Josephine

Compositions: coating or plastic

Coating or plastic compositions

Metal-depositing composition or substrate-sensitizing...

106 122, 427438, 4274431, C23C 1836

Patent

active

048447390

ABSTRACT:
The bath uses nickel-II-tri(ethylenediamine) hydroxide and/or cobalt-II-tri(ethylenediamine) hydroxide having the formula M(NH.sub.2 --C.sub.2 H.sub.4 --NH.sub.2).sub.3 (OH).sub.2 as a source of the metal to be deposited, where M represents nickel and/or cobalt, and where the ethylenediamine acts as the complexing agent.

REFERENCES:
patent: 3416955 (1968-12-01), Makowski et al.
patent: 4265943 (1981-05-01), Goldstein et al.
patent: 4368223 (1983-01-01), Kobayashi et al.
patent: 4371573 (1983-02-01), Januschkowetz
patent: 4636255 (1987-01-01), Tsuda et al.
Plating, vol. 54, No. 4, Apr. 1967, pp. 385-390, Dini et al., "Thick Nickel Deposits of High Purity by Electroless Methods".
Search Report for French Priority Application 85 17 339, Listing the Three Above Prior-Art Publications.

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