X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Reexamination Certificate
2008-07-22
2008-07-22
Kiknadze, Irakli (Department: 2882)
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
C378S084000, C378S070000
Reexamination Certificate
active
11237645
ABSTRACT:
An x-ray mirror provides focusing and monochromatization while maintaining a high degree of reflectivity. The mirror has at least two mirror portions, one with a multilayer surface that provides the desired monochromating, and the other with a total external reflection surface. The multiple surfaces combine to provide the desired focusing of the x-rays from a source to a focus point. A variety of configurations may be used, each of which does the desired focusing and monochromatization with minimal energy loss. Relative positioning of the mirror portions may also allow for adjustment of the focus length.
REFERENCES:
patent: 5454021 (1995-09-01), Nakajima et al.
patent: 6724858 (2004-04-01), Holz
patent: 2002/0064253 (2002-05-01), Gutman
patent: 2003/0128811 (2003-07-01), Verman et al.
Durst Roger D.
He Bob Baoping
Bruker AXS Inc.
Kiknadze Irakli
Law of Offices Paul E. Kudirka
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