Hybrid opto-electronic circuits and method of making

Optical waveguides – Integrated optical circuit

Reexamination Certificate

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C385S015000, C385S129000

Reexamination Certificate

active

06445837

ABSTRACT:

FIELD OF THE INVENTION
The present invention generally relates to integrated opto-electronic devices and waveguide circuits and more particularly to the hybrid integration of the active and passive optical elements and electronic chips on a common substrate.
BACKGROUND OF THE INVENTION
Large-scale integration of optical devices and elements is desirable to decrease the cost and increase the functionality of optical and opto-electronic devices and circuits. Two major integration methods are currently under the development—the monolithic approach and the hybrid approach. In the monolithic approach, all components such as laser sources, passive waveguide devices, detectors and so on are made on a common substrate from the same material such as silicon or InGaAsP series. In the hybrid approach, different components made of possibly different materials are mounted on a common substrate and are connected to each other by optical waveguides fabricated on the same substrate. In the hybrid approach, the waveguides are made of high-silica glasses that show very low propagation loss, whereas in the monolithic approach the waveguides are made of the same materials as the other components which are normally semiconductors and therefore are highly absorptive. Moreover monolithic integration of optical components may become very expensive since the fabrication process of the different optical elements are not compatible and could be destructive to one another resulting in a low yield.
Therefore, the hybrid integration is a more feasible yet more versatile approach. In U.S. Pat. No. 4,735,677, issued in April 1988, a method for fabricating hybrid optical integrated circuits is disclosed. In that method, optical fibers and semiconductor devices (e.g., laser diodes and detectors) are disposed on predetermined positions on a board and are aligned to pre-made waveguides by pre-made guides. The waveguides and guides are made on a substrate in one process and then the optical elements are placed on the pre-determined positions between the aligning guides. Positioning the devices into the guides and the optical alignment of the devices with the pre-made optical waveguide become very critical and time consuming resulting in expensive hybrid integrated circuits.
In U.S. Pat. No. 5,854,868 issued on Dec. 29, 1998, there is a disclosure of another fabrication method for hybrid integration of optical devices to waveguides. In that method, optical devices are first mounted on predetermined positions, while optical waveguides with a desired refractive index profile are fabricated afterwards. Provided that the optical devices are mounted on their ideal positions, one can quickly align the waveguides to their respective optical devices by means of markers and using a mask aligner. However, the optical devices are mounted manually on their predetermined positions by means of a solder, where it is very difficult to control the position of the mounted devices within the necessary precision, e.g. less than a micrometer. Therefore, this method will also suffer from misalignment errors.
In U.S. Pat. No. 5,737,458 and U.S. Pat. No. 5,562,838 adaptive lithography is employed to interconnect the optical elements already mounted on the substrate. In these disclosures, a laser milling process is proposed to create micro-channels for forming waveguides by filling the channels with a material with a slightly higher refractive index or to etch away the surface of the substrate coated with the waveguide material to form the channel waveguides for interconnection. However, laser milling or ablation may damage the optical elements mounted on the substrate and also results in waveguides with rough surfaces, which will have high scattering losses. Moreover, the laser ablation process employed in that method does not necessarily provide sufficient precision required for the optical alignments.
There is, therefore, a need for a method of hybrid integration that can solve the problem of incompatibility of the fabrication method and the alignment of the optical devices in a cost effective and feasible manner.
SUMMARY OF THE INVENTION
It is therefore an object of the present invention to provide a feasible method of hybrid integration of optical and electronic devices and components suitable for reducing misalignment errors.
To circumvent the problems mentioned above, the present invention provides a method for seamless hybrid integration of optical and/or electronic devices on a substrate. The method comprises of forming at least one layer of high silica glasses on a substrate and with mounted optical elements thereon. Optical elements in this invention include, but are not restricted to, devices such as lasers, detectors, lenses, prisms, isolators, waveguide bends, integrated optic devices with input and output, and the like. A device in this invention refers to any one of optical elements, electronic components and integrated circuits, as well as other opto-electronic devices.
At least one of the layers is a photosensitive glass layer in which refractive index or solubility is changed by exposure to a particular spectrum of electromagnetic radiation such as Ultra Violet (UV) light. The photosensitive layer is used as the core region of the waveguide interconnection circuit that will be printed by UV exposure. The substrate is etched or carved at the predetermined position with the predetermined depth such that the emitting and receiving areas of the optical devices are aligned vertically to the core layer level (i.e. the photosensitive layer).
The photosensitive layer may or may not be covered by another layer or layers of silica glass, which are almost transparent to that particular spectrum of electromagnetic radiation.
The substrate with deposited layer or layers of thin film glasses and with the optical elements mounted in the pre-made cavities is masked with a masking material such as chromium. Waveguides or other optical element patterns are then written on the upper layer by a suitable way such as adaptive electron-beam lithography. The substrate with the mask attached on it is then exposed to the light radiation (e.g. UV light) so that waveguides are created in the core layer and optical elements become optically interconnected. The mask pattern may contain lenses and micro prisms that will also be fabricated at the same time at the desired places or junctions. The spot-size of the different optical devices is matched either by the integrated lens or by appropriate tapering of the waveguide widths in the lateral axis and is vertically controlled by double exposure or by further selective exposure to a UV radiation. Alternatively, the waveguides are written by direct laser writing by means of moving either the laser beam or moving the substrate under the laser beam to fabricate the necessary interconnections.
For a precise alignment of optical waveguides to the optical devices, the exact position of mounted devices is detected by an imaging system that can then control a laser beam or an electron beam over the substrate. For instance, the image processor recognizes the actual positions of the devices on the substrate and transfers the pattern to a computer-controlled electron beam lithography machine to cerate a mask on the upper layer that will perfectly align the waveguides to the optical devices.
In accordance with a first aspect of the invention, there is provided a method for integrating at least one device on a substrate, comprising the steps of:
(a) coating a first side of said substrate with at least one layer including a core layer suitable for guiding light;
(b) carving at least one recess in said first side of the substrate and said at least one layer;
(c) mounting the at least one device in said at least one recess; and
(d) forming an optical waveguide coupled to said at least one device within said core layer.;
wherein said optical waveguide corresponds to a position of said at least one device relative to the substrate.
In accordance with a further aspect of the present invention there is provided a method

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