Hybrid moving stage and rastered electron beam lithography syste

Details Hybrid moving stage and rastered electron beam lithography syste Hybrid moving stage and rastered electron beam lithography syste

1981-09-08

1984-01-03

Anderson, Bruce C.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

H01J 7700

Patent

active

044244509

ABSTRACT:
A hybrid moving stage and scanning electron beam lithography system employs a circuit to make an approximate correction to the electron optical beam steering element. Correction is accomplished for observed, repetitive distortions. The position of the beam is thereby corrected for various modes of raster scan distortion. Field curvature distortion is corrected by a circuit which employs a term proportional to the square of the value of the scan direction coordinate. Keystone error is corrected by a circuit which employs a term proportional to the value of the coordinate orthogonal to the scan direction.

REFERENCES:
patent: 3706905 (1972-12-01), Alexander
patent: 3900737 (1975-08-01), Collier et al.
patent: 4362942 (1982-12-01), Yasuda
Asai et al, "Distortion Correction and Deflection Calibration by Means of Laser Interferometry in an Electron-Beam Exposure System," J. Vac. Sci. Technol., vol. 16, No. 6, Nov./Dec. 1979, p. 1710.
"Distortion Correction in Precision Cathode Ray Tube Display Systems", Published by Intronics Corp., 1970, pp. 1-14.

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