Hybrid inorganic/organic low k dielectric films with...

Details Hybrid inorganic/organic low k dielectric films with... Hybrid inorganic/organic low k dielectric films with...

2006-12-12

2006-12-12

Boykin, Terressa (Department: 1711)

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Cellular products or processes of preparing a cellular...

C252S500000, C257S040000

Reexamination Certificate

active

07148263

ABSTRACT:
A method of producing a nanoporous silica dielectric film having improved mechanical strength. A composition is formed which comprises in admixture a porogen, a solvent, a catalyst and a combination of silicon containing pre-polymers.

REFERENCES:
patent: 6248686 (2001-06-01), Inagaki et al.
patent: 2002/0065331 (2002-05-01), Zampini et al.
patent: 2004/0102006 (2004-05-01), Xu et al.
patent: 2002-134502 (2002-05-01), None

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