Hybrid focused-flood ion beam system and method

Details Hybrid focused-flood ion beam system and method Hybrid focused-flood ion beam system and method

1986-03-20

1987-08-18

Anderson, Bruce C.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250398, H01J 37317

Patent

active

046879404

ABSTRACT:
An ion beam microfabrication system is described which is capable of operating in either a flooded beam mode, in which a relatively high current beam is used to yield a rapid throughput, or in a low current, high resolution focused ion beam mode. With a focused beam a small, relatively low current ion spot is deflected in a predetermined pattern over a portion of the wafer to produce more detailed patterning that is not achievable in the flooded beam mode. A lens is added to the beam column to modify the beam collimation between the focused and flooded modes, and switching between modes is accomplished by simply actuating or de-actuating the lens. The beam is formed with a larger acceptance angle and total current in the flooded than the focused mode.

REFERENCES:
patent: 3117022 (1964-01-01), Bronson et al.
patent: 4263514 (1981-04-01), Reeds

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