Active solid-state devices (e.g. – transistors – solid-state diode – Responsive to non-electrical signal – Electromagnetic or particle radiation
Reexamination Certificate
2005-11-08
2005-11-08
Tran, Minhloan (Department: 2826)
Active solid-state devices (e.g., transistors, solid-state diode
Responsive to non-electrical signal
Electromagnetic or particle radiation
C257S081000, C257S083000, C257S084000, C385S014000, C385S031000, C385S039000
Reexamination Certificate
active
06963118
ABSTRACT:
A method for forming a hybrid active electronic and optical circuit using a lithography mask. The hybrid active electronic and optical circuit comprising an active electronic device and at least one optical device on a Silicon-On-Insulator (SOI) wafer. The SOI wafer including an insulator layer and an upper silicon layer. The upper silicon layer including at least one component of the active electronic device and at least one component of the optical device. The method comprising projecting the lithography mask onto the SOI waver in order to simultaneously pattern the component of the active electronic device and the component of the optical device on the SOI wafer.
REFERENCES:
patent: 3617109 (1971-11-01), Tien
patent: 5502779 (1996-03-01), Magel
patent: 5987196 (1999-11-01), Noble
Deliwala Shrenik
Patel Vipulkumar
Dickey Thomas L.
SiOptical Inc.
Tran Minhloan
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