Humidifying a reactant flow of a fuel cell system

Details Humidifying a reactant flow of a fuel cell system Humidifying a reactant flow of a fuel cell system

2005-12-27

2010-12-14

Maples, John S (Department: 1795)

Chemistry: electrical current producing apparatus, product, and

Fuel cell, subcombination thereof, or method of making or...

Process or means for producing, recycling, or treating...

C429S428000, C429S430000, C429S434000

Reexamination Certificate

active

07851096

ABSTRACT:
A technique that is usable with a fuel cell includes generating a humidified reactant flow. The technique includes measuring a rate of condensate production from the reactant flow and controlling the generation of the humidified reactant flow in response to the measured rate of condensate production.

REFERENCES:
patent: 5773160 (1998-06-01), Voss et al.
patent: 6376111 (2002-04-01), Mathias et al.
patent: 6497970 (2002-12-01), Fronk
patent: 6524733 (2003-02-01), Nonobe
patent: 6562501 (2003-05-01), Nagamiya et al.
patent: 6696192 (2004-02-01), Kanai et al.
patent: 6706429 (2004-03-01), Frank et al.
patent: 6746789 (2004-06-01), Chen et al.
patent: 6783878 (2004-08-01), Voss et al.
patent: 6821660 (2004-11-01), Andrews et al.
patent: 6869709 (2005-03-01), Shimotori et al.
patent: 2003/0104261 (2003-06-01), Schnitzer et al.
patent: 2003/0162065 (2003-08-01), Miyauchi et al.
patent: 2008/0014475 (2008-01-01), LeBoe et al.
Notice of Allowance in U.S. Appl. No. 11/823,552 entitled, “Anode Humidification,” filed on Jun. 28, 2007.

Affiliated with

Also associated with

Rating

Humidifying a reactant flow of a fuel cell system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Humidifying a reactant flow of a fuel cell system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Humidifying a reactant flow of a fuel cell system will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4195489