Hot wall diffusion furnace and method for operating the furnace

Details Hot wall diffusion furnace and method for operating the furnace Hot wall diffusion furnace and method for operating the furnace

1988-04-15

1989-12-12

Walberg, Teresa J.

Electric heating

Heating devices

Combined with container, enclosure, or support for material...

219411, 219388, H05B 362

Patent

active

048869546

ABSTRACT:
A diffusion furnace and method for processing semiconductor wafers standing on edge wherein the furnace has vertically adjacent electrical resistance heating elements wired in parallel and disposed above the wafers. This arrangement enables the heat input to the furnace by the heating elements to be varied. In a preferred embodiment, the heating elements in the upper section of the tube are connected in one circuit and the heating elements in the lower section of the tube are connected in a second circuit and each circuit is controlled in response to the temperature in that section.

REFERENCES:
patent: 3311694 (1967-03-01), Lasch, Jr.
patent: 3385921 (1968-05-01), Hampton
patent: 3385953 (1968-05-01), Henneberger
patent: 4348580 (1982-09-01), Drexel
patent: 4554437 (1985-11-01), Wagner et al.
patent: 4711989 (1987-12-01), Yu

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