Chemistry: electrical and wave energy – Apparatus – Electrolytic
Patent
1984-09-17
1986-05-13
Kaplan, G. L.
Chemistry: electrical and wave energy
Apparatus
Electrolytic
204426, 204428, G01N 2758
Patent
active
045884935
ABSTRACT:
An oxygen probe for measuring the characteristics of furnace gases. The probe includes electrodes of a long lasting and relatively inexpensive nickel containing alloy. The probe is formed with apertures and internal passages for ventilating the three phase contact zones between gas, electrolyte, and electrodes with furnace gases, thereby minimizing errors due to catalytic reactions at the electrodes. The probe sheath may be composed of the same alloy as the electrodes, and the electrodes may be fabricated as an integral part of the sheath, so that the sheath serves both as a structural member and as an electrical conductor for conducting voltage generated within the electrodes. A gas pump may be used to assure adequate ventilation to the electrode-electrolyte interfaces.
REFERENCES:
patent: 3454486 (1969-07-01), Davies
patent: 3546086 (1970-12-01), Sayles
patent: 3597345 (1971-08-01), Hickam et al.
patent: 3698384 (1972-10-01), Jones
patent: 3981785 (1976-09-01), Sandler
patent: 4101404 (1978-07-01), Blumenthal et al.
patent: 4186072 (1980-01-01), Blumenthal et al.
patent: 4193857 (1980-03-01), Bannister et al.
patent: 4290586 (1981-09-01), Kane et al.
patent: 4319966 (1982-03-01), Carlson et al.
R. G. H. Record, Metallurgia and Metal Forming, Dec. 1972-Jan. 1973.
Y. L. Sandler, J. Electrochem. Soc., pp. 1378-1381, Aug. 1971.
R. G. H. Record, Instrument Practice, Mar. 1970.
Metals Handbook, pp. 466-488, vol. I, 8th. ed., (1961).
Blumenthal Robert N.
Melville Andreas T.
LandOfFree
Hot gas measuring probe does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Hot gas measuring probe, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Hot gas measuring probe will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1768544