Hot element CVD apparatus and a method for removing a...

Coating processes – Interior of hollow article coating – Coating by vapor – gas – mist – or smoke

Reexamination Certificate

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C427S248100, C427S255280, C427S235000, C134S022100, C216S037000, C216S063000, C118S7230HC

Reexamination Certificate

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06942892

ABSTRACT:
The present invention provides a method for efficiently and completely removing a film deposited inside a film forming chamber. In addition, the invention provides a CVD apparatus using heating element which an in-situ cleaning method can be applied and its in-situ leaning method.The removal method of this invention comprises a method for removing a film deposited inside a chamber which can be exhausted and/or on a member placed in the chamber, wherein after the chamber is exhausted, a heating element, at least the surface of which is composed of platinum, disposed in said vacuum chamber, is heated at a prescribed temperature and a cleaning gas which is decomposed and/or activated by the heating element to generate an activated species that converts the deposited film into gaseous substance is introduced into the chamber.

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