Horizontal-type silicon-nitride furnace

Details Horizontal-type silicon-nitride furnace Horizontal-type silicon-nitride furnace

1998-12-15

2000-04-04

Bueker, Richard

Coating apparatus

Gas or vapor deposition

With treating means

118715, 432 93, 432200, 432205, C23C 1600

Patent

active

060456191

ABSTRACT:
A horizontal-type silicon-nitride furnace (HOSINF) having two tubes is provided. The HOSINF includes an outer tube and an inner tube. One end of the outer tube is coupled to a pump. The other end of the outer tube can be well sealed by a door through a flange. The inner tube is located inside the outer tube. The inner tube has a closed end and an opened end, in which the opened end is near to the door, and the closed end is near to the pump. The inner tube includes a first gas inlet and a second gas inlet. Desired reaction gases are flushed into the inner tube from the first inlet and the second inlet. The inner tube surrounds a paddle carrying several wafers, on which a silicon nitride layer is to be formed. The paddle is mounted on the door. A heater is located on a side periphery of the outer tube.

REFERENCES:
patent: 4615909 (1986-10-01), Thijssen et al.
patent: 4992044 (1991-02-01), Philipossian

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