Horizontal tram

Active solid-state devices (e.g. – transistors – solid-state diode – Regenerative type switching device – Combined with field effect transistor

Reexamination Certificate

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C257SE29221

Reexamination Certificate

active

11422560

ABSTRACT:
An integrated circuit structure includes providing a semiconductor substrate and forming a trench therein. A thyristor is formed around the trench and within the semiconductor substrate. The thyristor has at least four layers with three P-N junctions therebetween. A gate for the thyristor is formed within the trench. An access transistor is formed on the semiconductor substrate. An interconnect is formed between the thyristor and the access transistor.

REFERENCES:
patent: 5578522 (1996-11-01), Nakamura et al.
patent: 5838026 (1998-11-01), Kitagawa et al.
patent: 6690039 (2004-02-01), Nemati et al.
patent: 6696323 (2004-02-01), Yamaguchi et al.
patent: 6727528 (2004-04-01), Robins et al.
patent: 6815734 (2004-11-01), Horch et al.
patent: 6980457 (2005-12-01), Horch et al.
patent: 2005/0026337 (2005-02-01), Quek et al.
patent: 2005/0148118 (2005-07-01), Zheng et al.

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