Heating – Accessory means for holding – shielding or supporting work...
Patent
1985-05-09
1986-09-23
Yuen, Henry C.
Heating
Accessory means for holding, shielding or supporting work...
432 5, 432 6, 414152, F27D 500
Patent
active
046133054
ABSTRACT:
A horizontal furnace for processing semiconductor devices having a suspension cantilever which supports workpieces in the furnace tube to achieve particle or dust-free operation while still allowing the loading and unloading of workpieces to be heat-treated. The furnace tube consists of a heating chamber, a connecting chamber and a supporting chamber vertically connected to each other. The chambers correspond to an accommodating portion, a connecting portion and a supporting portion of the cantilever. The supporting chamber is kept at lower temperature than that of the heating chamber during heat processing to prevent deformation or creeping of the suspension cantilever.
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RCA Review, vol. 44, Jun. 1983, Olsen et al., "Double-Barrel III-V Compound Vapor-Phase Epitaxy Systems", pp. 270-286.
Journal of Vacuum Science & Technology, vol. 14, No. 5, Sep./Oct. 1977, New York; Kern et al., "Advances in Deposition Processes for Passivation Films", pp. 1082-1099.
Fujitsu Limited
Yuen Henry C.
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