Optical waveguides – With optical coupler – Input/output coupler
Reexamination Certificate
2003-07-18
2008-09-02
Fahmy, Wael (Department: 2814)
Optical waveguides
With optical coupler
Input/output coupler
C385S050000, C385S008000, C385S088000, C385S089000
Reexamination Certificate
active
07421158
ABSTRACT:
The invention is directed to a method for etching a solid state material to create a surface relief pattern. A resist layer is formed on the surface of the solid state material. The photoresist layer is holographically patterned to form a patterned mask. The pattern is then transferred into the solid state material by a dry etching process. The invention is especially useful for forming optical nanostructures. In preferred embodiments, a direct write process, such as ebeam lithography, is used to define defects and functional elements, such as waveguides and cavities.
REFERENCES:
patent: 5223356 (1993-06-01), Kumar et al.
patent: 6518194 (2003-02-01), Winningham et al.
patent: 6684007 (2004-01-01), Yoshimura et al.
M. Campbell et al., “Fabrication of photonic crystals for the visible spectrum by holographic lithography,” Letters to Nature, vol. 404, Mar. 2, 2000, pp. 53-56.
S. Shoji et al., “Photofabrication of three-dimensional photonic crystals by multibeam laser interference into a photopolymerizable resin,” Applied Physics Letters, vol. 76, No. 19, May 8, 2000, pp. 2668-2670.
P. Visconti et al. “Nanopatterning of organic and inorganic materials by holographic lithography and plasma etching,” Microelectronic Engineering, vol. 53, 2000, pp. 391-394.
Chen Chyong-Hua
Fainman Yeshaiahu
Nakagawa Wataru
Pang Lin
Sun Pang-Chen
Fahmy Wael
Greer Burns & Crain Ltd
Rao Steven H
The Regents of the University of California
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