Hologram element

Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask

Reexamination Certificate

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Details

C430S001000

Reexamination Certificate

active

10716811

ABSTRACT:
Provided in a photomask for use in production of a hologram element having desired optical characteristics, a method for producing a hologram element, and a hologram element having desired optical characteristics. The first photomask is used for photolithography-based production of a hologram element having a hologram divided into two regions carrying a diffraction grating. The first photomask includes the first, second mask region having the non-light-transmitting mask portion and the light-transmitting portion, for forming the diffraction gratings of the regions of the hologram. The two mask regions differ in alignment-direction-wise arrangement interval for the light-transmitting portions and in ratio of the alignment-direction-wise width to the alignment-direction-wise arrangement interval for the light-transmitting portions.

REFERENCES:
patent: 6866969 (2005-03-01), Miyamae et al.
patent: 10-10308 (1998-01-01), None
patent: 10-187014 (1998-07-01), None
patent: 10-254335 (1998-09-01), None
patent: 2000-121819 (2000-04-01), None
patent: 2002-258725 (2002-09-01), None

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