Hollow cathode target and methods of making same

Details Hollow cathode target and methods of making same Hollow cathode target and methods of making same

2005-03-28

2008-12-23

Sheehan, John P. (Department: 1793)

Metal treatment

Process of modifying or maintaining internal physical...

Heating or cooling of solid metal

C204S298130, C204S298120, C148S538000, C148S546000, C148S547000, C148S548000, C148S553000, C148S554000, C148S559000, C148S679000, C148S684000, C148S685000

Reexamination Certificate

active

07468110

ABSTRACT:
Sputtering targets and methods of making sputtering targets are described. The method includes the steps of: providing a sputtering metal workpiece made of a valve metal; transverse cold-rolling the sputtering metal workpiece to obtain a rolled workpiece; and cold-working the rolled workpiece to obtain a shaped workpiece. The sputtering targets exhibits a substantially consistent grain structure and/or texture on at least the sidewalls.

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Translation of first Office Action (Notice of Reasons for Rejection) in counterpart Japanese Patent Application No. 2002-545213 dated Dec. 18, 2007.

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