Hollow cathode gun and deposition device for ion plating process

Details Hollow cathode gun and deposition device for ion plating process Hollow cathode gun and deposition device for ion plating process

1988-02-04

1989-09-05

Nguyen, Nam X.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

20419231, 2191215, 21912152, 118723, 118726, C23C 1400, B23K 900

Patent

active

048635812

ABSTRACT:
A hollow cathode gun used in ion plating through the HCD process comprises a hollow cathode consisting of an outer graphite layer and an inner Ta, W or LaB.sub.6 layer. The deposition device hollow comprises at least one crucible housing an evaporation material, a substrate and a reaction gas inlet, and is provided with a focusing coil surronding the outer layer of the hollow cathode and another focusing coil surrounding the crucible.

REFERENCES:
patent: 3437734 (1969-04-01), Roman et al.
patent: 3486064 (1969-12-01), Stauffer
patent: 3491015 (1970-01-01), Naff
patent: 3984581 (1976-10-01), Dobler et al.
patent: 4147916 (1979-04-01), Fairbairn
patent: 4407712 (1983-10-01), Henshaw et al.
patent: 4415421 (1983-11-01), Sasanuma
patent: 4461689 (1984-07-01), Diepers
patent: 4481636 (1984-11-01), Curr et al.
patent: 4659899 (1987-04-01), Nelkie et al.

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