Hollow cathode discharge source of metal vapor

Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering

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204192N, 118723, 118726, 118 501, 250426, 313346DC, C23C 1312, C23C 1500

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active

044077122

ABSTRACT:
A hollow cathode discharge device is disclosed for ion plating a substrate with high temperature metal vapor. A hollow cathode tube is adapted to receive pellets of the high temperature metal at a short location from the cathode tube opening which is selected to correspond to a temperature peak along the length of the cathode tube. The temperature peak is a characteristic of the cathode diameter and gas flow rate in the tube. Inert gas is supplied to the tube and, the tube may be shielded and provided with a constriction at its end opening. An anode is spaced from the cathode tube opening and power supply is provided for supplying a negative bias to the cathode tube and a positive bias to the anode.

REFERENCES:
patent: 3404084 (1968-10-01), Hamilton
patent: 3491015 (1970-01-01), Naff
patent: 3830721 (1974-08-01), Gruen et al.
patent: 3836451 (1974-09-01), Snaper
patent: 4094764 (1978-06-01), Boucher et al.
patent: 4197175 (1980-04-01), Moll et al.
patent: 4254159 (1981-03-01), Pulker et al.
patent: 4321126 (1982-03-01), Kieferle et al.
patent: 4346123 (1982-08-01), Kaufmann
patent: 4351855 (1982-09-01), Pinkhasov
T. Spalvins, "Survey of Ion Plating Sources," J. Vac. Sci. Technol., vol. , pp. 315-321 (1980).

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