Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1982-06-01
1983-10-04
Weisstuch, Aaron
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
204192N, 118723, 118726, 118 501, 250426, 313346DC, C23C 1312, C23C 1500
Patent
active
044077122
ABSTRACT:
A hollow cathode discharge device is disclosed for ion plating a substrate with high temperature metal vapor. A hollow cathode tube is adapted to receive pellets of the high temperature metal at a short location from the cathode tube opening which is selected to correspond to a temperature peak along the length of the cathode tube. The temperature peak is a characteristic of the cathode diameter and gas flow rate in the tube. Inert gas is supplied to the tube and, the tube may be shielded and provided with a constriction at its end opening. An anode is spaced from the cathode tube opening and power supply is provided for supplying a negative bias to the cathode tube and a positive bias to the anode.
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T. Spalvins, "Survey of Ion Plating Sources," J. Vac. Sci. Technol., vol. , pp. 315-321 (1980).
Henshaw William F.
Niiler Andrus
White John R.
Erkkila A. Victor
Gibson Robert P.
Lane Anthony T.
The United States of America as represented by the Secretary of
Weisstuch Aaron
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