Radiation imagery chemistry: process – composition – or product th – Electric or magnetic imagery – e.g. – xerography,... – Radiation-sensitive composition or product
Patent
1991-12-23
1993-08-03
Goodrow, John
Radiation imagery chemistry: process, composition, or product th
Electric or magnetic imagery, e.g., xerography,...
Radiation-sensitive composition or product
G03G 5047
Patent
active
052328015
ABSTRACT:
Disclosed are hole-transport polymeric liquid crystalline compounds having the formula (I) ##STR1## wherein A and B are alkylsubstituted siloxane or acrylate repeating units;
REFERENCES:
patent: 4657694 (1987-04-01), Heeger et al.
patent: 4769448 (1988-09-01), Heeger et al.
patent: 4894263 (1990-01-01), Dubois et al.
patent: 5116708 (1992-05-01), Shikatani et al.
H. Finkelmann et al., Makromel. Chem., 1978 179, pp. 273-276; Model Considerations and Examples and Enantiotropic Liquid Crystalline Polymers.
L. L. Chapoy et al., Macromolecules, 1983, 16, pp. 181-185; A Helical Poly(amino acid) Having Carbazole Side Chains: A Candidate for a Photoelectric Liquid Crystal 1. Synthesis and Characterization.
H. Ringsdorf et al., Makromol. Chem., 1984, 185, pp. 1327-1334; Electro-optical effects of azo dye containing liquid crystalline copolymers.
H. Ringsdorf et al., Makromol Chem., 1987, 188, pp. 1355-1366; Synthesis and characterization of liquid-crystalline copolymers with dichroic dyes and mesogens as side groups.
H. Finkelmann, Angew. Chem. Int. Ed. Engl., 1987, 26, pp. 816-824; Liquid Crystalline Polymers.
Chen Jiann H.
Rule Norman G.
Eastman Kodak Company
Goodrow John
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