Highly wear-resistant thermal print heads with silicon-doped dia

Incremental printing of symbolic information – Thermal marking apparatus or processes – Specific resistance recording element type

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

B41J 2335

Patent

active

060467584

ABSTRACT:
The invention provides a thermal print head with a protective coating of silicon-doped diamond-like carbon (Si-DLC) which imparts superior wear resistance, and improved lifetime. The Si-DLC is comprised of the elements C, H, Si and possibly O, N and Ar. The highly wear and abrasion-resistant Si-DLC diamond-like carbon coating is deposited by ion-assisted plasma deposition including direct ion beam deposition and capacitive radio frequency plasma deposition, from carbon-containing and silicon-containing precursor gases consisting of hydrocarbon, silane, organosilane, organosilazane and organo-oxysilicon compounds, or mixtures thereof. The resulting Si-DLC coating has the properties of Nanoindentation hardness in the range of approximately 10 to 35 GPa, thickness in the range of approximately 0.5 to 20 micrometers, dynamic friction coefficient of less than approximately 0.2, and a silicon concentration in the range of approximately 5 atomic % to approximately 40 atomic %. Optimum performance is obtained when the Si-DLC coating hardness is in the range of approximately 15 to 35 GPa, preferably in the range of about 15 GPa to about 19 GPa, and the Si-DLC layer thickness is in the range of approximately 2 micrometers to approximately 10 micrometers, dynamic friction coefficient of less than approximately 0.15, and a silicon concentration in the range of approximately 10 atomic % to 30 atomic %, preferably in the range of about 15 atomic percent to about 24 atomic percent.

REFERENCES:
patent: 5238705 (1993-08-01), Hayashi et al.
patent: 5508368 (1996-04-01), Knapp et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Highly wear-resistant thermal print heads with silicon-doped dia does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Highly wear-resistant thermal print heads with silicon-doped dia, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Highly wear-resistant thermal print heads with silicon-doped dia will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-369974

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.