Highly sensitive positive photoresist composition

Details Highly sensitive positive photoresist composition Highly sensitive positive photoresist composition

1997-10-30

2000-04-18

Lipman, Bernard

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Mixing of two or more solid polymers; mixing of solid...

5253289, 5253333, 5253335, 525355, C08F 800

Patent

active

060516593

ABSTRACT:
Positive resists sensitive to UV, electron beam, and x-ray radiation which are alkaline developable are formulated from a polymer material comprising recurrent structures having alkaline soluble groups pendent to the polymer backbone, a portion of which groups are substituted with acid labile groups.

REFERENCES:
patent: 4491628 (1985-01-01), Ito et al.
patent: 4507230 (1985-03-01), Tam et al.
patent: 4552833 (1985-11-01), Ito et al.
patent: 4613398 (1986-09-01), Chiong et al.
patent: 4678737 (1987-07-01), Schneller
patent: 4810613 (1989-03-01), Osuch et al.
patent: 4812542 (1989-03-01), Schwalm et al.
patent: 5350660 (1994-09-01), Urano et al.
H, Ito, "Solid-State Thermolysis of Poly(p-t-Butoxycarbonyloxystyrene) Catalyzed by Polymeric Phenol: Effect of Phase Separation", Journal of Polymer Science: Part A, vol. 24, p. 2971-2980, (1986).

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