Highly selective chelating resins and monomers for their prepara

Organic compounds -- part of the class 532-570 series – Organic compounds – Heterocyclic carbon compounds containing a hetero ring...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

546264, 546329, C07D40100, C07D21336, C07D21170

Patent

active

051808226

ABSTRACT:
Described are preferred monomers including a vinylbenzyl moiety N-bonded to an alkylaminopyridinyl or pyridylimidazolyl function. Also described are preferred acid salts of such monomers. Additionally, preferred processes involving and resins formed from these preferred monomers are described. The preferred resins are highly selective for valuable heavy metal ions such as copper and demonstrate superior iron rejection values.

REFERENCES:
patent: 4031038 (1977-06-01), Grinstead et al.
patent: 4202944 (1980-05-01), Hancock et al.
patent: 4533621 (1985-08-01), Ikeuchi et al.
Montheard, Jean-Pierre, et al., "Chemical Transformations of Chloromethylated Polystyrene," J. Macromol. Sci.-Rev., Macromol. Chem Phys., C28(3&4), 503-592 (1988).
Camps, Marcel, et al., "Chloromethylstyrene: Synthesis, Polymerization, Transformations, Applications," J. Macromol. Sci.-Rev., Macromol. Chem Phys., C22(3), 343-407 (1982-83).
Tomoi, Masao, et al., "Synthesis and Catalytic Activity of Polymer-Bound 4-(N-Benzyl-N-methylamino)pyridine," Macromol. Chem., Rapid Commun. 3. 537-542 (1982).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Highly selective chelating resins and monomers for their prepara does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Highly selective chelating resins and monomers for their prepara, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Highly selective chelating resins and monomers for their prepara will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-102935

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.