Highly photosensitive aqueous solvent-developable printing assem

Details Highly photosensitive aqueous solvent-developable printing assem Highly photosensitive aqueous solvent-developable printing assem

1984-05-11

1985-06-04

Welsh, John D.

Radiation imagery chemistry: process, composition, or product th

Electric or magnetic imagery, e.g., xerography,...

To produce printing surface

430302, 430319, G03G 1328

Patent

active

045215030

ABSTRACT:
A photoimageable printing assembly comprises:

REFERENCES:
patent: 2939787 (1960-06-01), Giaimo
patent: 2959481 (1960-11-01), Kucers
patent: 3152895 (1964-10-01), Tinker et al.
patent: 3248217 (1966-04-01), Shulman
patent: 3404979 (1968-10-01), Bonjour
patent: 3428452 (1969-02-01), Giaimo
patent: 3507692 (1970-04-01), Ghys et al.
patent: 3558544 (1971-01-01), Cole et al.
patent: 3582321 (1971-06-01), Ueda et al.
patent: 3585027 (1971-06-01), Shimizu
patent: 3704122 (1972-11-01), Yamagucki et al.
patent: 3725061 (1973-04-01), Verhille et al.
patent: 3923509 (1975-12-01), Kuehn et al.
patent: 4104072 (1978-08-01), Golda et al.
patent: 4226930 (1980-10-01), Takimoto et al.
patent: 4401743 (1983-08-01), Incremona
patent: 4408532 (1983-10-01), Incremona
Kitamura and Kokado, P. S. and E., 26, 158 (1982).

Affiliated with

Also associated with

Rating

Highly photosensitive aqueous solvent-developable printing assem does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Highly photosensitive aqueous solvent-developable printing assem, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Highly photosensitive aqueous solvent-developable printing assem will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-829118