Stock material or miscellaneous articles – Composite – Of metal
Patent
1995-04-12
1997-07-15
Turner, Archene
Stock material or miscellaneous articles
Composite
Of metal
428212, 428323, 428457, 428472, 428698, C23C 1400
Patent
active
056481748
ABSTRACT:
A hard thin film having fine crystalline ceramic particles dispersed in a metallic matrix phase is disclosed. The production of the film is effected by first depositing a substantially amorphous film on a substrate and then heat-treating the deposited film. Deposition of the film on the substrate is carried out by using a source of evaporation having a composition represented by the general formula: Al.sub.a M.sub.b, wherein M stands for at least one element selected from the group consisting of Ti, Ta, V, Cr, Zr, Nb, Mo, Hf, W, Mn, Fe, Co, Ni, and Cu and "a" and "b" respectively stand for atomic % in the ranges of 60.ltoreq.a.ltoreq.98.5 and 1.5.ltoreq.b.ltoreq.40, providing a+b=100. Deposition is effected by a physical vapor deposition process in an atmosphere of an inert gas containing a reaction gas while controlling the feed rate of the reaction gas into a chamber in such a manner that the partial pressure of the react/on gas is kept constant or varied continuously or stepwise. By this method, there can be obtained a hard composite film having fine ceramic particles dispersed in a metallic matrix phase or a dense, hard, and composite film having a composition and structure obliquely varied from a substantially crystalline metallic phase to a crystalline ceramic phase in the direction of thickness of the film.
REFERENCES:
patent: 4592781 (1986-06-01), Cheney et al.
patent: 4738389 (1988-04-01), Moshier et al.
patent: 4770701 (1988-09-01), Henderson et al.
patent: 4915903 (1990-04-01), Brupbacher et al.
patent: 4915905 (1990-04-01), Kampe et al.
patent: 4916030 (1990-04-01), Christodoulou et al.
patent: 4921531 (1990-05-01), Nagle et al.
patent: 5093148 (1992-03-01), Christodoulou et al.
patent: 5093207 (1992-03-01), Hodes et al.
patent: 5405458 (1995-04-01), Yamagata et al.
patent: 5423923 (1995-06-01), Yamagata et al.
"Production of compositionally gradient Al-AIN films by reative sputtering and their mechanical and electrical properties", J. Appl. Phys. 71(7), Apr. 1, 1992, pp. 3278-3282.
Inoue Akihisa
Masumoto Tsuyoshi
Nagahora Junichi
Yamagata Hiroshi
Inoue Akihisa
Masumoto Tsuyoshi
Turner Archene
Yoshida Kogyo K.K.
LandOfFree
Highly hard thin film and method for production thereof does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Highly hard thin film and method for production thereof, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Highly hard thin film and method for production thereof will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1491440