Highly-depleted laser doped semiconductor volume

Active solid-state devices (e.g. – transistors – solid-state diode – Responsive to non-electrical signal – Electromagnetic or particle radiation

Reexamination Certificate

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C257S463000, C257SE31093

Reexamination Certificate

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07745901

ABSTRACT:
A device with increased photo-sensitivity using laser treated semiconductor as detection material is disclosed. In some embodiments, the laser treated semiconductor may be placed between and an n-type and a p-type contact or two Schottky metals. The field within the p-n junction or the Schottky metal junction may aid in depleting the laser treated semiconductor section and may be capable of separating electron hole pairs. Multiple device configurations are presented, including lateral and vertical configurations.

REFERENCES:
patent: 4201450 (1980-05-01), Trapani
patent: 4277793 (1981-07-01), Webb
patent: 4965784 (1990-10-01), Land et al.
patent: 5773820 (1998-06-01), Osajda et al.
patent: 7057256 (2006-06-01), Carey, III et al.
patent: 7354792 (2008-04-01), Carey, III et al.
patent: 7390689 (2008-06-01), Mazur et al.
patent: 7442629 (2008-10-01), Mazur et al.
patent: 7504702 (2009-03-01), Mazur et al.
patent: 2006/0231914 (2006-10-01), Carey, III et al.
patent: 2008/0258604 (2008-10-01), Mazur et al.
patent: 20080912452 (2008-07-01), None
Carey, et al., “Fabrication of Micrometer-Sized Conical Field Emitters Using Femtosecond Laser-Assisted Etching of Silicon,” Proc. IVMC 2001, 75-76, UC Davis, Davis, CA.
Carey, et al., “Field Emission from Silicon. Microstructures Formed by Femtosecond Laser Assisted Etching,” Proc. CLEO 2001 (Baltimore, MD 2001) 555-557.
Carey, et al., “Femtosecond Laser-Assisted Microstructuring of Silicon for Novel Detector, Sensing and Display Technologies”, LEOS 2002, 97-98, Glasgow, Scotland.
Carey, et al., “High Sensitivity Silicon-Based VIS/NIR Photodetectors”, Optical Society of America (2003) 1-2.
Carey, et al. “Femtosecond Laser-Assisted Microstructuring of Silicon for Novel Detector, Sensing and Display Technologies”, LEOS 2003, 481-482, Tuscon, AR.
Carey et al., “Femtosecond-Laser-Assisted Microstructuring of Silicon Surfaces”, Optics and Photonics News, 2003. 14, 32-36.
Crouch et al., “Infrared Absorption by Sulfur-Doped Silicon Formed by Femtosecond Laser Irradiation”, Appl. Phys. A, 2004, 79, 1635-1641.
Crouch et al., “Comparison of Structure and Properties of Femtosecond and Nanosecond Laser-Structured Silicon” Appl. Phys. Lett., 2004, 84, 1850-1852.
Dolgaev et al., “Formation Of Conical Microstructures Upon Laser Evaporation Of Solids”, Appl. Phys. A, 2001, 73, 177-181.
Fowlkes et al., “Surface Microstructuring And Long-Range Ordering Of Silicon Nanoparticles”, Appl. Phys. Lett., 2002, 80 (20), 3799-3801.
Her et al., “Novel Conical Microstructures Created In Silicon With Femtosecond Laser Pulses”, CLEO 1998, 511-512, San Francisco, CA.
Her et al., “Microstructuring of Silicon with Femtosecond Laser Pulses,” Applied Physics Letters, 1998, 1673-1675. vol. 73, No. 12, American Institute of Physics.
Her, et al., “Femtosecond laser-induced formation of spikes on silicon,” Applied Physics A, 2000, 70, 383-385.
Hu et al., “Solar Cells from Basic to Advanced Systems,” McGraw Hill Book Co., 1983, 39, New York, New York.
Pedraza et al., “Surface Nanostructuring Of Silicon”, Appl. Phys. A, 2003, 77, 277-284.
Pedraza et al., “Silicon Microcolumn Arrays Grown By Nanosecond Pulsed-Excimer Laser Irradiation”, Appl. Phys. Lett., 1999, 74 (16), 2322-2324, American Institute of Physics.
Sanchez et al., “Dynamics Of The Hydrodynamical Growth Of Columns On Silicon Exposed To ArF Excimer-Laser Irradiation”, Appl. Phys. A, 1998, 66, 83-86.
Sanchez et al., “Whiskerlike Structure Growth On Silicon Exposed To ArF Laser Irradiation”, Appl. Phys. Lett., 1996, 69 (5), 620-622.
Serpengüzel et al., “Temperature Dependence Of Photluminescence In Non-Crystalline Silicon”, Photonics West (San Jose, CA, 2004) 454-462.
Shen et al., “Formation Of Regular Arrays Of Silicon Micorspikes By Femtosecond Laser Irradiation Through A Mask”, Appl. Phys. Lett., 82, 1715-1717 (2003).
Solar Energy Research Institute, “Basic Photovoltaic Principles and Methods,” Van Nonstrand Reinhold Co., NY 1984, pp. 45-47 and 138-142.
Wu et al., “Black Silicon: A New Light Absorber,” APS Centennial Meeting (Mar. 23, 1999).
Wu et al., “Femtosecond laser-gas-solid interactions,” Thesis presented to the Department of Physics at Harvard University, pp. 1-113, 126-136, Aug. 2000.
Wu et al., “Visible Luminescence From Silicon Surfaces Microstructured In Air”. Appl. Phys. Lett., vol. 81, No. 11, 1999-2001 (2002).
Younkin, “Surface Studies and Microstructure Fabrication Using Femtosecond Laser Pulses,” Thesis presented to the Divison of Engineering & Applied sciences at Harvard University (Aug. 2001).
Younkin et al., “Infrared Absorption By Conical Silicon Microstructures Made In A Variety Of Background Gases Using Femtosecond-Laser Pulses”, J. Appl. Phys., 93, 2626-2629 (2003).
Chien et al, “Pulse Width Effect in Ultrafast Laser Processing of Materials,” Applied Physics A, 2005, 1257-1263, 81, Springer Berlin, Heidelberg, Germany.
Nayak et al, “Semiconductor Laesr Crystallization of a-Si:H,” SPIE Digital Library, 2003, 277-380, vol. 4977, Bellingham, Washington.
Nayak et al, “Semiconductor Laser Crystallization of a-Si:H on Conducting Tin-Oxide-Coated Glass for Solar Cell and Display Applications,” Applied Physics A, 2005, 1077-1080, 80, Springer Berlin, Heidelberg, Germany.
Nayak et al, “Ultrafast-Laser-Assisted Chemical Restructuring of Silicon and Germanium Surfaces,” Applied Surface Science, 2007, 6580-6853, vol. 253, Issue 15, Elsevier B.V.
Nayak et al, “Ultrafast Laser Textured Silicon Solar Cells,” Mater. Res. Soc. Symp. Proc., 2009, vol. 1123, Materials Research Society.
Zhang et al, “Ultra-Shallow P+-Junction Formation in Silicon by Excimer Laser Doping: a Heat and Mass Transfer Perspective,” Int. J. Heat Mass Transfer, 1996, 3835-3844, vol. 39, No. 18, Elsevier Science Ltd., Great Britain.

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