X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Reexamination Certificate
2009-03-04
2010-06-15
Kiknadze, Irakli (Department: 2882)
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
C378S084000
Reexamination Certificate
active
07738630
ABSTRACT:
An x-ray analysis apparatus for illuminating a sample spot with an x-ray beam. An x-ray tube is provided having a source spot from which a diverging x-ray beam is produced, the source spot requiring alignment along a transmission axis passing through the sample spot. A first housing section is provided, to which the x-ray tube is attached, including mounting features for adjustably mounting the x-ray tube therein such that the source spot coincides with the transmission axis. A second housing section includes a second axis coinciding with the transmission axis; and at least one x-ray optic attached to the second housing section for receiving the diverging x-ray beam and directing the beam toward the sample spot. Complimentary mating surfaces may be provided to align the first and second sections, and the optics, to the transmission axis. A third housing section may also be provided, including an aperture through which the x-ray beam passes, and to which a detector may be attached.
REFERENCES:
patent: 5177774 (1993-01-01), Suckewer et al.
patent: 5192869 (1993-03-01), Kumakhov
patent: 7542548 (2009-06-01), Matsuo et al.
Bailey Adam
Burdett, Jr. John H.
Chen Zewu
Semken R. Scott
Xin Kai
Heslin Rothenberg Farley & & Mesiti P.C.
Kiknadze Irakli
Klembczyk, Esq. Jeffrey
Radigan, Esq. Kevin P.
X-Ray Optical Systems, Inc.
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