Chemistry of inorganic compounds – Silicon or compound thereof – Binary compound
Patent
1991-04-30
1993-03-02
Chaudhuri, Olik
Chemistry of inorganic compounds
Silicon or compound thereof
Binary compound
501 88, C01B 3136
Patent
active
051907372
ABSTRACT:
A process for preparing silicon carbide by carbothermal reduction which includes transporting, in a gaseous medium, a particulate reactive mixture of a silica source and a carbon source through a reaction zone. The heating rate of the atmosphere within the reaction zone is such that substantially all of the reactive mixture is heated at a heating rate of at least about 100.degree. C./second until an elevated temperature of at least 1800.degree. C. is reached. Either (1) carbon monoxide is added to the reaction zone or (2) a carbon monoxide level in the reaction is achieved in order to provide at least about 30 mole percent of the gases exiting the reaction zone to achieve a higher yield of silicon carbide.
REFERENCES:
patent: 3271109 (1966-09-01), Mezey et al.
patent: 3709981 (1973-01-01), Lee et al.
patent: 3836356 (1974-09-01), Irani
patent: 3920446 (1975-11-01), Irani
patent: 4162167 (1979-06-01), Enomoto et al.
patent: 4217335 (1980-08-01), Sasaki et al.
patent: 4226841 (1980-10-01), Komeya et al.
patent: 4283375 (1981-08-01), Horne, Jr. et al.
patent: 4292276 (1981-09-01), Enomoto et al.
patent: 4410502 (1983-10-01), Yamaguchi et al.
patent: 4467042 (1984-08-01), Hatta et al.
patent: 4529575 (1985-07-01), Enomoto et al.
patent: 4543240 (1985-09-01), Goldberger
patent: 4690811 (1987-09-01), Kida et al.
patent: 4702900 (1987-10-01), Kurachi et al.
patent: 4818511 (1989-04-01), Nishi et al.
patent: 4839150 (1989-06-01), Coyle et al.
patent: 4869886 (1989-09-01), Saiki et al.
patent: 5108461 (1992-04-01), Ruthner
Acta Chemica Scandinavica A 35, Oxidation of Silicon Carbide in Oxygen and in Water Vapour at 1500.degree. C., 1981, pp. 247-254.
Advances in Ceramics, Production of Fine, High-Purity, Beta SiC Powder, 1987, pp. 257-263.
Lee et al., Formation of Silicon Carbide from Rice Hulls, 1975, pp. 195-198.
Henley John P.
Roach Raymond P.
Weimer Alan W.
Chaudhuri Olik
Horton Ken
The Dow Chemical Company
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