Coating apparatus – Gas or vapor deposition – Having means to expose a portion of a substrate to coating...
Patent
1992-07-15
1993-06-01
Bueker, Richard
Coating apparatus
Gas or vapor deposition
Having means to expose a portion of a substrate to coating...
118715, 118718, 118717, 118726, 118729, C23C 1400
Patent
active
052155897
ABSTRACT:
A high-vacuum coating apparatus for coating films has beneath its coating cylinder (7) a pivoting unit (8) which can turn on a pivot shaft (25). It has an adjustable mask (29) and thereunder a shutter (28) which can run from a position covering an evaporator to a position releasing it. Due to its ability to turn, the pivoting unit (8) together with its parts can easily be cleaned.
REFERENCES:
patent: 4953497 (1990-09-01), Kessler
patent: 4962725 (1990-10-01), Heinz
Schoenherr Bernhard
Wenk Karl-Heinrich
Bueker Richard
Leybold Aktiengesellschaft
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