High-vacuum coating apparatus

Details High-vacuum coating apparatus High-vacuum coating apparatus

1992-07-15

1993-10-19

Hearn, Brian E.

Coating apparatus

Gas or vapor deposition

Running length work

118719, 118726, 118733, 118730, C23C 1424, C23C 1426

Patent

active

052541690

ABSTRACT:
A vacuum tank (1) in which a film is coated under high vacuum is divided by a partition wall (26) into a coating chamber (28) and a winding chamber (27) containing a supply roll (21) and a take-up roll (22). The coating chamber (28) contains an evaporator bank (24). Into the latter a coating cylinder (27) reaches. Diffusion pumps (14, 15) are connected exclusively to the coating chamber (28), so that the high vacuum necessary for the coating need be produced only in this coating chamber (28) and not in the entire vacuum tank (1). An inflatable gasket (32), variable in cross section, seals the partition wall (26) from the vacuum tank wall (1).

REFERENCES:
patent: 2971862 (1961-02-01), Baer et al.
patent: 3854442 (1974-12-01), Adam et al.
patent: 4380211 (1983-04-01), Shinohara
patent: 4450186 (1984-05-01), Shinohara
patent: 4469335 (1984-09-01), Moore
patent: 4581245 (1986-04-01), Nakamura et al.
patent: 4622919 (1986-01-01), Suzuki et al.
patent: 4655167 (1987-04-01), Nakamura et al.
patent: 4692233 (1987-09-01), Casey
patent: 4962725 (1990-01-01), Heinz et al.
patent: 5076203 (1991-12-01), Vaidya et al.
Wolf, Silicon Processing for the VLSI Era, 1986, pp. 78, 85-87, 89-92.
JP 010230775 A (Matsushita) Derwent English abstract, Sep. 1989.
JP 600017074 A (Konishiroku) Derwent English abstract, Jan. 1985.

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