High-transmission attenuating PSM

Details High-transmission attenuating PSM High-transmission attenuating PSM

2007-07-12

2010-06-01

Rosasco, Stephen (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07727683

ABSTRACT:
An attenuating PSM includes a quartz substrate, a first dummy pad pattern disposed on the quartz substrate, wherein the first dummy pad pattern is composed of a first phase shifter material layer with a transmission rate of greater than or equal to 15%, and a first opaque pattern disposed at a center area of the first dummy pad pattern. The first opaque pattern has a shape that is analogous to the first dummy pad pattern and surface area of the first opaque pattern is smaller than that of the first dummy pad pattern.

REFERENCES:
patent: 6623895 (2003-09-01), Chen et al.
patent: 6787274 (2004-09-01), Park
patent: 7045255 (2006-05-01), Misaka

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