High throughput wafer stage design for optical lithography...

Details High throughput wafer stage design for optical lithography... High throughput wafer stage design for optical lithography...

2006-10-06

2010-02-09

Mathews, Alan A (Department: 2851)

Photocopying

Projection printing and copying cameras

Detailed holder for photosensitive paper

C355S053000, C355S071000, C355S072000, C355S077000, C430S311000

Reexamination Certificate

active

07659965

ABSTRACT:
An optical lithography exposure apparatus which may be a stepper or a scanner, provides a wafer chuck that retains a wafer and at least one opaque exposure shield that extends over a discrete peripheral edge portion of the wafer thereby preventing illumination from exposing the portion of the wafer beneath the exposure shield. In a positive photoresist system, the portions of the wafer blocked from exposure by the shields, include alignment marks and the unexposed photoresist remains over the alignment marks thereby protecting the alignment marks from destruction or damage during subsequent patterning operations used to form patterns in the film being patterned.

REFERENCES:
patent: 5760881 (1998-06-01), Miyazaki et al.
patent: 6239862 (2001-05-01), Mulkens et al.
patent: 2003/0138742 (2003-07-01), Irie et al.
patent: 2006/0250594 (2006-11-01), Iwashita et al.

Affiliated with

Also associated with

Rating

High throughput wafer stage design for optical lithography... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with High throughput wafer stage design for optical lithography..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High throughput wafer stage design for optical lithography... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4216681