High throughput wafer notch aligner

Details High throughput wafer notch aligner High throughput wafer notch aligner

2011-05-24

2011-05-24

Crawford, Gene (Department: 3651)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Article handling

C700S218000

Reexamination Certificate

active

07949425

ABSTRACT:
An ion implantation apparatus, system, and method are provided for a transferring a plurality of workpieces between vacuum and atmospheric pressures, wherein an alignment mechanism is operable to align a plurality of workpieces for generally simultaneous transportation to a dual-workpiece load lock chamber. The alignment mechanism comprises a characterization device, an elevator, and two vertically-aligned workpiece supports for supporting two workpieces. First and second atmospheric robots are configured to generally simultaneously transfer two workpieces at a time between load lock modules, the alignment mechanism, and a FOUP. Third and fourth vacuum robots are configured to transfer one workpiece at a time between the load lock modules and a process module.

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Non-Final Office Action Dated Jun. 18, 2010 from U.S. Appl. No. 11/634,644, 9 Pages.

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