High throughput/high resolution particle beam system

Details High throughput/high resolution particle beam system High throughput/high resolution particle beam system

1981-07-06

1984-04-24

Anderson, Bruce C.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

250398, A01J 3726

Patent

active

044450397

ABSTRACT:
A particle beam lithographic system and method using smaller address structure particle beam for generating masks for integrated circuit technology utilizing an electrostatic deflector system to sweep the beam in the serpentine path for increased throughput.

REFERENCES:
patent: 3900737 (1975-08-01), Collier et al.
patent: 4283631 (1981-08-01), Turner
patent: 4363953 (1982-12-01), Katsuta et al.
"Automatic Electron Beam Fabrication of Micron-Size Devices," Wilson et al., Scanning Electron Microscopy, Apr. 1976, pp. 659-668.

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