Superconductor technology: apparatus – material – process – High temperature – per se – Having tc greater than or equal to 150 k
Patent
1990-08-17
1993-03-23
Nguyen, Nam X.
Superconductor technology: apparatus, material, process
High temperature , per se
Having tc greater than or equal to 150 k
20419215, 20419224, 427 34, 427423, 505731, C23C 1434, H01L 3924
Patent
active
051964007
ABSTRACT:
A target which is a good conductor of heat and electricity is plasma sprayed with a weakly conducting material such as a metallic oxide. The target is then employed in a magnetron sputtering apparatus to sputter the material sprayed onto the target onto a substrate. The technique permits use of power densities and target sizes and shapes which are advantageous for sputtering substrates having large surface areas.
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"Hoehler and Neeb, Preparation of Thin TBa.sub.2 Cu.sub.3 O.sub.7 Layers . . . by d.c. Magnetron Sputtering", Journal of the Less Common Metals 151 (1989) pp. 341-344.
Perkin-Elmer Metco Division, Advertising Brochure, Plasma Spray Technology for Superconductor Research, 1988, p. 2, col. 3.
Chen Chiou T.
Krause Dennis L.
AT&T Bell Laboratories
Nelson Gordon E.
Nguyen Nam X.
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