Coating apparatus – Gas or vapor deposition – Running length work
Patent
1998-02-05
1999-11-02
Cano, Milton
Coating apparatus
Gas or vapor deposition
Running length work
118724, 118725, 219388, 392417, 392418, 414147, 414150, 414152, 414157, 414210, 414211, 414287, 414288, 414304, 414325, 414327, 414935, 432121, 42722528, 42722529, C23C 1646
Patent
active
059762586
ABSTRACT:
A system and method for processing a substrate. The system includes a substrate heating station, a processing station, a conveyor for transporting the heated substrate from the substrate heating station to the processing station and a conveyor heating station. A substrate transfer station is located between the substrate heating station, the conveyor heating station and the processing station for the transfer of the heated substrate to the conveyor in a thermally controlled environment isolated from contaminants. The substrate transfer station includes a housing having an interior chamber, first and second inlets for the separate passage of a substrate and conveyor into the interior chamber, and an outlet for the egress of the substrate and conveyor. The transfer station also includes a heater and a guide assembly for directing the conveyor between the conveyor inlet and the outlet. The method includes heating a substrate, heating a conveyor and moving the heated conveyor through an enclosure, moving the heated substrate into the enclosure through a separate inlet port and positioning the heated substrate on the heated conveyor in the interior chamber, moving the heated conveyor and substrate through the outlet port of the enclosure, and moving the heated conveyor and substrate through at least one processing station.
REFERENCES:
patent: 4913090 (1990-04-01), Harada et al.
patent: 5129360 (1992-07-01), Ahern et al.
patent: 5814153 (1998-09-01), Ishikawa
Cano Milton
Semiconductor Equipment Group, LLC
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