High temperature resistant polysulfone-polyimide block copolycon

Details High temperature resistant polysulfone-polyimide block copolycon High temperature resistant polysulfone-polyimide block copolycon

1989-12-15

1991-07-30

Bleutge, John C.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Mixing of two or more solid polymers; mixing of solid...

525534, 525535, 525906, C08G 7523

Patent

active

050361465

ABSTRACT:
High temperature resistant polysulfone-polyimide block copolycondensates suitable for example for producing shaped articles are composed of at least one polyarylene ether sulfone block comprising units of the structure ##STR1## and at least one polyimide block comprising units of the structure ##STR2## where R.sup.1 and R.sup.2 are identical or different and each is hydrogen or methyl and X is methylene or 1,2-ethylene, and are prepared by condensing conventionally obtained amine-terminated polyarylene ether sulfone blocks with polyimide blocks in the melt.

REFERENCES:
patent: 3663507 (1972-05-01), Nogel et al.
patent: 4175175 (1979-11-01), Johnson et al.
patent: 4540748 (1985-09-01), Matzner et al.
Synthesis of Polymide-Poly(Arylene Ether Sulfone)Copolymers, Polymer Preprints, 25 (1984), pp. 49-51, Bruce C. Johnson, et al.
J. Chem. Soc. (1961), 1604-1610, J. H. Golden, Poly-p-xylylene and Related Polymers.
J. Polymer Sci., 40 (1961), pp. 399-406, William M. Eareckson III, Interfacial Polycondensation. X. Polyphenyl Esters.

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