Static information storage and retrieval – Floating gate – Particular biasing
Reexamination Certificate
2007-04-27
2010-11-23
Nguyen, Dang T (Department: 2824)
Static information storage and retrieval
Floating gate
Particular biasing
C365S185020, C365S185280, C365S201000
Reexamination Certificate
active
07839695
ABSTRACT:
Methods are described for improving the retention of a memory device by execution of a retention improvement procedure. The retention improvement procedure comprises a baking process of the memory device in a high temperature environment, a verifying process of the memory device that checks the logic state of memory cells, and a reprogramming process to program the memory device once again by programming memory cells in a 0-state to a high-Vt state. The baking step of placing the memory device in a high temperature environment causes a charge loss by expelling shallow trapped charges, resulting in the improvement of retention reliability.
REFERENCES:
patent: 6075724 (2000-06-01), Li et al.
patent: 6344994 (2002-02-01), Hamilton et al.
patent: 6618290 (2003-09-01), Wang et al.
patent: 6778442 (2004-08-01), Hamilton et al.
patent: 6813752 (2004-11-01), Hsia et al.
patent: 6993690 (2006-01-01), Okamoto
patent: 7259995 (2007-08-01), Shih et al.
patent: 2007/0263444 (2007-11-01), Gorobets et al.
Janai, Meir et al., “Data Retention Reliability Model of NROM Nonvolatile Memory Products,” IEEE Transactions on Device and Materials Reiliability vol. 4, No. 3, Sep. 2004, 12 pages.
Hsu Tzu Hsuan
Wu Chao-I
Haynes Beffel & Wolfeld LLP
Macronix International Co. Ltd.
Nguyen Dang T
Sofocleous Alexander
LandOfFree
High temperature methods for enhancing retention... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with High temperature methods for enhancing retention..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High temperature methods for enhancing retention... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4154416