High-temperature high-pressure gas processing apparatus

Details High-temperature high-pressure gas processing apparatus High-temperature high-pressure gas processing apparatus

1997-04-28

1999-04-27

Hoang, Tu Ba

Industrial electric heating furnaces

Resistance furnace device

With internal atmosphere control

219403, 427331, 100317, F27D 706

Patent

active

058987274

ABSTRACT:
The present invention provides a processing apparatus for eliminating pores in via holes of a silicon semiconductor. The apparatus includes a high-pressure vessel divided into at least two vessel component members in the axial direction thereof, at least one of which has a cooling unit, a frame for holding a load acting in the axial direction of the high-pressure vessel in processing a workpiece to be processed in the high-pressure vessel, an actuator for moving the vessel component members of the high-pressure vessel in the axial direction thereof so as to load and unload the workpiece, a sealing unit fitted to a portion for loading and unloading the workpiece, which is formed when the vessel component members are moved in the axial direction of the vessel, and a retractable cotter unit for transmitting a load acting in the axial direction of the high-pressure vessel to the frame.

REFERENCES:
patent: 5518771 (1996-05-01), Jeffryes, et al.

Affiliated with

Also associated with

Rating

High-temperature high-pressure gas processing apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with High-temperature high-pressure gas processing apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High-temperature high-pressure gas processing apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-690682