High temperature decomposition of hydrogen peroxide

Details High temperature decomposition of hydrogen peroxide High temperature decomposition of hydrogen peroxide

2004-08-12

2011-10-04

Duong, Tom (Department: 1774)

Chemical apparatus and process disinfecting, deodorizing, preser

Chemical reactor

Waste gas purifier

Reexamination Certificate

active

08029736

ABSTRACT:
Nitric oxide (NO) is oxidized into nitrogen dioxide (NO2) by the high temperature decomposition of a hydrogen peroxide solution to produce the oxidative free radicals, hydroxyl and hydroperoxyl. The hydrogen peroxide solution is impinged upon a heated surface in a stream of nitric oxide where it decomposes to produce the oxidative free radicals. Because the decomposition of the hydrogen peroxide solution occurs within the stream of the nitric oxide, rapid gas-phase oxidation of nitric oxide into nitrogen dioxide occurs.

REFERENCES:
patent: 3019197 (1962-01-01), Saunders
patent: 3991167 (1976-11-01), Depommier
patent: 4341747 (1982-07-01), Downey
patent: 4426364 (1984-01-01), Cooper
patent: 5000930 (1991-03-01), Boguslawski
patent: 5112587 (1992-05-01), Von Wedel
patent: 5120508 (1992-06-01), Jones
patent: 5366711 (1994-11-01), von Wedel
patent: 5550096 (1996-08-01), Inoue
patent: 5980847 (1999-11-01), Iwasaki
patent: 6047543 (2000-04-01), Caren
patent: 6162409 (2000-12-01), Skelley
patent: 6264899 (2001-07-01), Caren
patent: 6284211 (2001-09-01), Miyadera
S. Noda et al., “Gas-Phase Hydroxyl Radical Generation by the Surface Reactions Over Basic Metal Oxides,” J.Phys. Chem. B (1998), 102, pp. 3185-3191.

Affiliated with

Also associated with

Rating

High temperature decomposition of hydrogen peroxide does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with High temperature decomposition of hydrogen peroxide, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High temperature decomposition of hydrogen peroxide will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4271957