High temperature chemical reaction processes utilizing fluid-wal

Details High temperature chemical reaction processes utilizing fluid-wal High temperature chemical reaction processes utilizing fluid-wal

1976-12-10

1978-06-20

Sebastian, Leland A.

Specialized metallurgical processes, compositions for use therei

Processes

Electrothermic processes

75 05BA, 75 05BB, 75 34, 75 36, 75 74, 75 81, 75 82, 75 83, 423345, 423439, B22F 900, C22B 100

Patent

active

040959740

ABSTRACT:
A high temperature chemical reaction process in which mineral ores or inorganic compounds are reduced to a lower valence state with hydrogen, carbon, synthesis gas, or other reducing agent can be conducted in fluid-wall reactors by a process which includes the steps of (a) generating an annular envelope of an inert fluid which is substantially transparent to radiation within a shell of a refractory material which reflects radiation; the volume enclosed by the shell constituting a black body cavity, the envelope having substantial axial length and the interior of the envelope defining a reaction chamber; (b) passing at least one reactant into the black body cavity and through the reaction chamber along a predetermined path substantially coincident with the longitudinal axis of the envelope, the reactants being confined within the reaction chamber; and (c) directing high intensity radiant energy into the reaction chamber to coincide with at least a portion of the predetermined path of the reactants, sufficient radiant energy being absorbed within the reaction chamber to raise the temperature of the reactants to a level required to initiate and sustain the desired chemical reaction.

REFERENCES:
patent: 3384467 (1968-05-01), Ammann et al.
patent: 3468632 (1969-09-01), Gunnell et al.
patent: 3491010 (1970-01-01), Ishibashi
patent: 3663394 (1972-05-01), Kawahara
patent: 3703460 (1972-11-01), Shair et al.
patent: 3719454 (1972-03-01), Shang

Affiliated with

Also associated with

Rating

High temperature chemical reaction processes utilizing fluid-wal does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with High temperature chemical reaction processes utilizing fluid-wal, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and High temperature chemical reaction processes utilizing fluid-wal will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1132350